Method of forming an image pickup device having two waveguides and a light-shielding member

ABSTRACT

A solid-state image pickup device includes a semiconductor substrate in which photoelectric conversion units are arranged. An insulator is disposed on the semiconductor substrate. The insulator has holes associated with the respective photoelectric conversion units. Members are arranged in the respective holes. A light-shielding member is disposed on the opposite side of one of the members from the semiconductor substrate, such that only the associated photoelectric conversion unit is shielded from light. In the solid-state image pickup device, the holes are simultaneously formed and the members are simultaneously formed.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a Divisional of U.S. application Ser. No. 13/362,649, filed Jan. 31, 2012, which claims priority from Japanese Patent Application No. 2011-026352 filed Feb. 9, 2011, which is hereby incorporated by reference herein in its entirety.

BACKGROUND OF THE INVENTION

Field of the Invention

The present invention relates to a solid-state image pickup device and a method of making the same.

Description of the Related Art

Solid-state image pickup devices have recently been proposed which include an optical waveguide in order to increase the quantity of light incident on a photoelectric conversion unit.

Japanese Patent Laid-Open No. 2007-141873 discloses a solid-state image pickup device having a light-receiving area where pixels receiving light from a subject are arranged and a light-shielding area where light-shielded pixels are arranged. In the solid-state image pickup device illustrated in FIG. 1 disclosed in Japanese Patent Laid-Open No. 2007-141873, a first high refractive index region, serving as an optical waveguide, is disposed just above a first photoelectric conversion unit positioned in the light-receiving area. A second high refractive index region is disposed between a second photoelectric conversion unit positioned in the light-shielding area and a first interconnect disposed so as to cover the second photoelectric conversion unit.

The solid-state image pickup device disclosed in Japanese Patent Laid-Open No. 2007-141873 has the following disadvantages. First, the magnitude of dark current of each pixel in the light-receiving area may differ from that of each pixel in the light-shielding area. The reason is that the structure of the optical waveguide of each pixel in the light-receiving area markedly differs from that in the light-shielding area. Specifically, the upper surface of the first high refractive index region, serving as the optical waveguide of the pixel in the light-receiving area, differs from that of the second high refractive index region, serving as an optical waveguide of the pixel in the light-shielding region, in the level relative to a semiconductor substrate as illustrated in FIG. 1 of Japanese Patent Laid-Open No. 2007-141873. Accordingly, those regions differ from each other in the cross-sectional area.

Second, the parasitic capacitance of an interconnect for signal transmission of each pixel in the light-receiving area may differ from that of each pixel in the light-shielding area. The reason is that the structures of interconnects in the light-receiving area markedly differ from those in the light-shielding area. Specifically, the structure of a first interconnect closest to the semiconductor substrate in the light-receiving area differs from that in the light-shielding area.

Third, the extent of damage caused by a making process in the light-receiving area may differ from that in the light-shielding area. The reason is that a process of forming the optical waveguide of each pixel in the light-receiving area differs from that in the light-shielding area.

The above-described first to third disadvantages may increase the difference in noise between pixels in the light-receiving area and pixels in the light-shielding area.

SUMMARY OF THE INVENTION

The present invention provides a solid-state image pickup device including a semiconductor substrate, a first photoelectric conversion unit and a second photoelectric conversion unit arranged in the semiconductor substrate, a first member disposed on the semiconductor substrate, a second member disposed on the semiconductor substrate so as to overlap the first photoelectric conversion unit, a third member disposed on the semiconductor substrate so as to overlap the second photoelectric conversion unit, a plurality of interconnect layers arranged on the semiconductor substrate, and a light-shielding member disposed on an opposite side of the third member from the semiconductor substrate, the light-shielding member being configured to block at least part of light entering the second photoelectric conversion unit. The first member includes a first portion and a second portion, and both of the first and second portions do not overlap the first photoelectric conversion unit. The second member is disposed between the first and second portions. The first member includes a third portion and a fourth portion, and both of the third and fourth region do not overlap the second photoelectric conversion unit. The third member is disposed between the third and fourth portions. A first distance between the semiconductor substrate and an opposite surface of the second member from the semiconductor substrate and a second distance between the semiconductor substrate and an opposite surface of the third member from the semiconductor substrate are less than a third distance between the semiconductor substrate and the light-shielding member. The first distance and the second distance are greater than a fourth distance between the semiconductor substrate and an opposite surface of a conductive member, included in the closest interconnect layer to the semiconductor substrate of the interconnect layers, from the semiconductor substrate.

The present invention further provides a solid-state image pickup device including a semiconductor substrate, a first photoelectric conversion unit and a second photoelectric conversion unit arranged in the semiconductor substrate, a first member disposed on the semiconductor substrate, a second member disposed on the semiconductor substrate so as to overlap the first photoelectric conversion unit, a third member disposed on the semiconductor substrate so as to overlap the second photoelectric conversion unit, a plurality of interconnect layers arranged on the semiconductor substrate, and a light-shielding member disposed on an opposite side of the third member from the semiconductor substrate, the light-shielding member being configured to block at least part of light entering the second photoelectric conversion unit. The first photoelectric conversion unit and the second member are arranged in line along a first direction. The first member includes a first portion and a second portion. The first portion, the second member, and the second portion are arranged in line along a second direction intersecting the first direction. The first member includes a third portion and a fourth portion. The third portion, the third member, and the fourth portion are arranged in line along a third direction intersecting the first direction. A first distance between the semiconductor substrate and an opposite surface of the second member from the semiconductor substrate and a second distance between the semiconductor substrate and the opposite surface of the third member from the semiconductor substrate are less than a third distance between the semiconductor substrate and the light-shielding member. The first distance and the second distance are greater than a fourth distance between the semiconductor substrate and an opposite surface of a conductive member, included in a closest interconnect layer to the semiconductor substrate of the interconnect layers, from the semiconductor substrate.

The present invention further provides a method of making a solid-state image pickup device, the method including forming a first insulator on a semiconductor substrate in which a first photoelectric conversion unit and a second photoelectric conversion unit are arranged. The method includes simultaneously removing a first portion and a second portion of the first insulator, the first portion being associated with the first photoelectric conversion unit, the second portion being different from the first portion and being associated with the second photoelectric conversion unit. The method includes simultaneously forming a first member and a second member such that the first member is positioned in a region where the first portion has been removed and the second member is positioned in a region where the second portion has been removed. The method includes forming, after the forming the first and second members, a light-shielding member configured to block at least part of light entering the second photoelectric conversion unit. The method includes forming, after the forming a light-shielding member, forming a second insulator. After the forming the second insulator, removing only one of a third portion and a fourth portion of the second insulator is not performed, the third portion being associated with the first photoelectric conversion unit, the fourth portion being associated with the second photoelectric conversion unit.

The present invention further provides a method of making a solid-state image pickup device, the method including forming a first etching stopper on a semiconductor substrate in which a first photoelectric conversion unit and a second photoelectric conversion unit are arranged such that the first etching stopper overlaps the first photoelectric conversion unit. The method includes forming a second etching stopper on the semiconductor substrate such that the second etching stopper overlaps the second photoelectric conversion unit. The method includes forming a first insulator on the semiconductor substrate and the first and second etching stoppers. The method includes simultaneously etching a first portion and a second portion of the first insulator, the first portion being positioned on the first etching stopper, the second portion being different from the first portion and being positioned on the second etching stopper. The method includes simultaneously forming a first member and a second member such that the first member is positioned in a region where the first portion has been removed by etching and the second member is positioned in a region where the second portion has been removed by etching. The method includes forming, after the forming the first and second members, a light-shielding member configured to block at least part of light entering the second photoelectric conversion unit. And the method includes forming, after the forming the light-shielding member, a second insulator. After the forming the second insulator, removing only one of a third portion and a fourth portion of the second insulator is not performed, the third portion being associated with the first photoelectric conversion unit, the fourth portion being associated with the second photoelectric conversion unit. An etching rate of the first and second etching stoppers is lower than that of the first insulator. The first insulator is etched such that at least the first and second etching stoppers are exposed.

Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view of a schematic structure of a solid-state image pickup device according to a first embodiment.

FIG. 2A is a diagram illustrating a method of making the solid-state image pickup device according to the first embodiment.

FIG. 2B is a diagram illustrating the method of making the solid-state image pickup device according to the first embodiment.

FIG. 2C is a diagram illustrating the method of making the solid-state image pickup device according to the first embodiment.

FIG. 3A is a diagram illustrating the method of making the solid-state image pickup device according to the first embodiment.

FIG. 3B is a diagram illustrating the method of making the solid-state image pickup device according to the first embodiment.

FIG. 3C is a diagram illustrating the method of making the solid-state image pickup device according to the first embodiment.

FIG. 4A is a plan view of a schematic structure of the solid-state image pickup device according to the first embodiment.

FIG. 4B is a cross-sectional view of a schematic structure of the solid-state image pickup device according to the first embodiment.

FIG. 4C is a cross-sectional view of a schematic structure of the solid-state image pickup device according to the first embodiment.

FIG. 5A is a cross-sectional view of a schematic structure of a solid-state image pickup device according to a second embodiment.

FIG. 5B is a plan view of the schematic structure of the solid-state image pickup device according to the second embodiment.

FIG. 6 is a cross-sectional view of a schematic structure of a solid-state image pickup device according to a third embodiment.

DESCRIPTION OF THE EMBODIMENTS

A solid-state image pickup device 100 according to the present invention includes a semiconductor substrate 101. The semiconductor substrate 101 is a semiconductor component of components constituting the solid-state image pickup device 100. Examples of the semiconductor substrate 101 include a semiconductor substrate made by forming semiconductor regions in a semiconductor wafer using a known semiconductor making process. Examples of a semiconductor material include silicon. The interface between the semiconductor material and another material is a principal surface 102 of the semiconductor substrate 101. The other material is, for example, a thermally-oxidized film disposed on the semiconductor substrate 101 in contact therewith. In FIG. 1, arrows L denote a direction of incidence of light. The light impinges on the principal surface 102 and enters the semiconductor substrate 101.

In this specification, the term “plan” means a plane parallel to the principal surface 102. For example, the principal surface 102 in a region where a photoelectric conversion unit, which will be described later, is disposed, or the principal surface 102 in a channel of a MOS transistor may be used as a reference. In this specification, the term “cross section” means a plane vertical to the “plan”.

The semiconductor substrate 101 includes a photoelectric conversion unit 103 a and a photoelectric conversion unit 103 b. Light from a subject enters the photoelectric conversion unit 103 a positioned in a light-receiving area (effective pixel area). Accordingly, a signal from the photoelectric conversion unit 103 a can be processed as a pixel signal of a captured image. The photoelectric conversion unit 103 b positioned in a light-shielding area (optical black area) is shielded from light. Accordingly, a signal from the photoelectric conversion unit 103 b can be processed as a black level reference signal. Note that as long as electrons in the photoelectric conversion unit 103 b can be read as signals, photoelectric conversion is not necessarily needed in the photoelectric conversion unit 103 b.

An insulator 104 is disposed on the principal surface 102 of the semiconductor substrate 101. A component that comprises a conductive material may be disposed instead of the insulator 104. The insulator 104 has a hole 105 a associated with the photoelectric conversion unit 103 a and a hole 105 b associated with the photoelectric conversion unit 103 b. As regards the shape of each hole in cross section, the holes 105 a and 105 b do not have to completely pass through the insulator 104. The insulator 104 may have depressions instead of the respective holes 105 a and 105 b. As regards the shape of each hole in plan, the hole is shaped in a closed loop, for example, circular or rectangular. Alternatively, the hole may be a groove extending over a plurality of photoelectric conversion units, as viewed in plan. In this specification, the insulator 104 can be regarded as having a hole so long as a first region where the insulator 104 is not disposed is surrounded by a second region where the insulator 104 is disposed, or the first region is sandwiched by the second regions in a certain plane.

As regards the position of the hole 105 a in plan, the hole 105 a is disposed such that at least part of the hole 105 a overlaps the photoelectric conversion unit 103 a. Specifically, in the case where the hole 105 a and the photoelectric conversion unit 103 a are projected on the same plane, this plane has an area where both the hole 105 a and the photoelectric conversion unit 103 a are projected. As regards the position of the hole 105 b in plan, the hole 105 b is disposed such that at least part of the hole 105 b overlaps the photoelectric conversion unit 103 b.

A waveguide member 106 a is disposed in the hole 105 a. The hole 105 a can be filled with the waveguide member 106 a. The waveguide member 106 a may, however, be omitted in part of the hole 105 a. A waveguide member 106 b is disposed in the hole 105 b. The hole 105 b can be filled with the waveguide member 106 b. The waveguide member 106 b may, however, be omitted in part of the hole 105 b. Consequently, the waveguide member 106 a is disposed such that at least part of the waveguide member 106 a overlaps the photoelectric conversion unit 103 a. In addition, the waveguide member 106 b is disposed such that at least part of the waveguide member 106 b overlaps the photoelectric conversion unit 103 b.

The positional relationship between the insulator 104 and the waveguide members 106 a and 106 b will now be described. In a certain plane, a region where the waveguide member 106 a is disposed is surrounded by the second region where the insulator 104 is disposed, alternatively, the region is sandwiched by the second regions. In a certain plane, a region where the waveguide member 106 b is disposed is surrounded by the second region where the insulator 104 is disposed, alternatively, the region is sandwiched by the second regions. In other words, a first portion of the insulator 104, a second portion thereof different from the first portion, and the waveguide member 106 a are arranged in line along a direction intersecting the direction in which the photoelectric conversion unit 103 a and the waveguide member 106 a are arranged in line. The direction intersecting the direction in which the photoelectric conversion unit 103 a and the waveguide member 106 a are arranged in line is parallel to, for example, the principal surface 102 of the semiconductor substrate 101. Furthermore, a third portion of the insulator 104, a fourth portion thereof different from the third portion, and the waveguide member 106 b are arranged in line along a direction intersecting the direction in which the photoelectric conversion unit 103 b and the waveguide member 106 b are arranged in line. The direction intersecting the direction in which the photoelectric conversion unit 103 b and the waveguide member 106 b are arranged in line is parallel to, for example, the principal surface 102 of the semiconductor substrate 101.

In another aspect, such a structure will be described as follows. The insulator 104 includes the first portion and the second portion which do not overlap the photoelectric conversion unit 103 a and the waveguide member 106 a is disposed between the first and second portions. The insulator 104 includes the third portion and the fourth portion which do not overlap the photoelectric conversion unit 103 b and the waveguide member 106 b is disposed between the third and fourth portions.

A material of the waveguide member 106 a is different from that of the insulator 104. A material of the waveguide member 106 b is different from that of the insulator 104. The waveguide members 106 a and 106 b can comprise the same material. A dielectric constant of the material of the waveguide members 106 a and 106 b may be higher than that of the insulator 104.

A refractive index of the material of the waveguide members 106 a and 106 b can be higher than that of the insulator 104. According to the above relationship between the refractive indices, the interface between the waveguide member 106 a and the insulator 104 can refract light entering the waveguide member 106 a toward the photoelectric conversion unit 103 a. In other words, the quantity of leakage light, which leaks into the insulator 104, of the light entering the waveguide member 106 a can be reduced. Accordingly, so long as at least part of the waveguide member 106 a overlaps the photoelectric conversion unit 103 a, the quantity of light entering the photoelectric conversion unit 103 a can be increased.

It is not necessary that the refractive index of the waveguide members 106 a and 106 b be higher than that of the insulator 104. So long as a structure is made such that light entering a predetermined region does not leak into the surrounding insulator, the structure functions as an optical waveguide. For example, a reflective member that reflects light may be disposed on a side wall of the hole 105 a and a transparent member that is transmissive to light may be disposed on the other portion of the hole 105 a. In this case, the refractive index of the transparent member and that of the surrounding insulator 104 may have any relationship therebetween. In this case, the reflective member comprises a material different from that of the surrounding insulator 104. According to a modification, an air gap may be disposed between the waveguide member 106 a and the insulator 104. In this case, the air gap may be included in a first member.

A light-shielding member 108 is disposed on an opposite side of the waveguide member 106 b from the semiconductor substrate 101. The light-shielding member 108 blocks most or all of the light traveling toward the photoelectric conversion unit 103 b. In the case where the whole surfaces of the solid-state image pickup device 100 is irradiated with a uniform quantity of light, the light-shielding member 108 permits the quantity of light entering the photoelectric conversion unit 103 b to be lower than that of light entering the photoelectric conversion unit 103 a. For example, the light-shielding member 108 is metal disposed over the photoelectric conversion unit 103 b. The light-shielding member 108 may be metal disposed over the light-shielding area including the photoelectric conversion unit 103 b. The placement of the light-shielding member 108 on the opposite side of the waveguide member 106 b from the semiconductor substrate 101 means that the waveguide member 106 b is disposed between the semiconductor substrate 101 and the light-shielding member 108.

A first interconnect layer 112 a and a second interconnect layer 112 b are arranged adjacent to the principal surface 102 of the semiconductor substrate 101. The first interconnect layer 112 a, the second interconnect layer 112 b, and an interconnect layer including the light-shielding member 108 constitute a multilayer interconnect structure. The distance between the first interconnect layer 112 a and the principal surface 102, the distance between the second interconnect layer 112 b and the principal surface 102, and the distance between the interconnect layer including the light-shielding member 108 and the principal surface 102 differ from one another. The first interconnect layer 112 a is the closest interconnect layer to the semiconductor substrate 101. The first interconnect layer 112 a and the second interconnect layer 112 b each include a conductive member. Each conductive member is shaped in a predetermined pattern and serves as interconnects. The interconnect layer including the light-shielding member 108 may include only the light-shielding member 108. Alternatively, the interconnect layer including the light-shielding member 108 may include a conductive member other than the light-shielding member 108. The multilayer interconnect structure in the present invention may include either one of the first and second interconnect layers 112 a and 112 b and the interconnect layer including the light-shielding member 108.

A feature of one aspect of the present invention is the positional relationship in cross section between the waveguide members 106 a and 106 b, the light-shielding member 108, and the conductive member included in the first interconnect layer 112 a.

Let d1 denote the distance between the principal surface 102 and an opposite surface 107 a of the waveguide member 106 a from the semiconductor substrate 101. Let d2 denote the distance between the principal surface 102 and an opposite surface of the waveguide member 106 b from the semiconductor substrate 101. Let d3 denote the distance between the principal surface 102 and the surface of the light-shielding member 108 facing the semiconductor substrate 101. Let d4 denote the distance between the principal surface 102 and an opposite surface of the conductive member, included in the first interconnect layer 112 a, from the semiconductor substrate 101. The distance d1 and the distance d2 are less than the distance d3. The distance d1 and the distance d2 are greater than the distance d4.

In this arrangement, the opposite surfaces of the waveguide members 106 a and 106 b from the semiconductor substrate 101 are positioned at a level between the first interconnect layer 112 a and the light-shielding member 108. Accordingly, the waveguide member 106 a disposed in the hole 105 a and the waveguide member 106 b disposed in the hole 105 b can be permitted to have substantially the same structure. In other words, an optical waveguide associated with the photoelectric conversion unit 103 a in the light-receiving area and an optical waveguide associated with the photoelectric conversion unit 103 b in the light-shielding area can be permitted to have substantially the same structure.

A feature of another aspect of the present invention is simultaneous formation of the holes 105 a and 105 b in the insulator 104 and simultaneous formation of the waveguide members 106 a and 106 b. In this specification, the simultaneous formation of the holes 105 a and 105 b means that a semiconductor process is performed not only to form one hole but also to form the other hole at the same time. The simultaneous formation of the waveguide members 106 a and 106 b means that a semiconductor process is performed not only to form one waveguide member but also to form the other waveguide member at the same time. Examples of the semiconductor process include layer deposition, etching, polishing, chemical mechanical planarization (CMP), cleaning, heat treatment, and ion implantation.

After the simultaneous formation of the waveguide members 106 a and 106 b, the light-shielding member 108 is formed. As regards an insulator formed after the formation of the light-shielding member 108, removing only one of a portion associated with a first photoelectric conversion unit and another portion associated with a second photoelectric conversion unit is not performed.

As described above, since the waveguide members 106 a and 106 b are formed by the same process, the extent of damage caused by the process on one waveguide member and that on the other waveguide member can be equalized. Consequently, the difference between noise caused in the photoelectric conversion unit 103 a in the light-receiving area and that in the photoelectric conversion unit 103 b in the light-shielding area can be reduced.

The simultaneous formation of the holes 105 a and 105 b may permit the holes 105 a and 105 b in the insulator 104 to have substantially the same structure. In addition, the simultaneous formation of the waveguide members 106 a and 106 b may permit the waveguide member 106 a disposed in the hole 105 a and the waveguide member 106 b disposed in the hole 105 b to have substantially the same structure. In other words, the optical waveguide associated with the photoelectric conversion unit 103 a in the light-receiving area and the optical waveguide associated with the photoelectric conversion unit 103 b in the light-shielding area can be permitted to have substantially the same structure.

Specific embodiments of the present invention will be described below. The present invention is not limited to specific components in the embodiments and appropriate modifications and variations may be made without departing from the spirit and concept of the present invention.

First Embodiment

A solid-state image pickup device according to a first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view of a schematic structure of the solid-state image pickup device, indicated at 100, according to this embodiment. In this embodiment, a single pixel is illustrated in the light-receiving area and a single pixel is illustrated in the light-shielding area. In actual, a plurality of pixels are arranged in matrix in the light-receiving area. In addition, a plurality of pixels are arranged in the light-shielding area. In the following description, it is assumed that electrons are signal carriers. Holes may be signal carriers. In the case where holes serve as signal carriers, the conduction types of semiconductor regions may be reversed.

In this embodiment, a semiconductor substrate 101 is an n-type epitaxial layer. In the semiconductor substrate 101, p-type semiconductor regions and n-type semiconductor regions are arranged. The semiconductor substrate 101 has a principal surface 102. In this embodiment, the principal surface 102 is the interface between the semiconductor substrate 101 and a thermally-oxidized film (not illustrated) laminated on the semiconductor substrate 101. Light passes through the principal surface 102 and enters the semiconductor substrate 101. The arrows L denote the direction of incidence of light.

Photoelectric conversion units 103 a and 103 b are photodiodes, for example. In this embodiment, the photoelectric conversion units 103 a and 103 b each include an n-type semiconductor region constituting the photodiode. Carriers caused by photoelectric conversion are collected in the n-type semiconductor region. Each p-type semiconductor region 109 is disposed in contact with the principal surface 102 of the semiconductor substrate 101. The area of the photoelectric conversion unit 103 a may be different from that of the photoelectric conversion unit 103 b. Furthermore, the photoelectric conversion unit 103 b may include no n-type semiconductor region. The photoelectric conversion unit 103 b is shielded from light, such that a signal from the photoelectric conversion unit 103 b may be used as a black level reference signal. In this case, since it is unnecessary to collect carriers caused by photoelectric conversion, the photoelectric conversion unit 103 b may include no n-type semiconductor region. In addition, so long as electrons in the photoelectric conversion unit 103 b can be read as signals, photoelectric conversion is not necessarily needed in the photoelectric conversion unit 103 b.

Each floating diffusion (FD) region 110 is an n-type semiconductor region. Carries generated in each photoelectric conversion unit 103 is transferred to the corresponding FD region 110 and is converted into a voltage. The FD region 110 is electrically connected to an input node of an amplifying unit (not illustrated). Alternatively, the FD region 110 may be electrically connected to a signal output line (not illustrated). Each gate electrode 111 is disposed above the semiconductor substrate 101, with the thermally-oxidized film (not illustrated) therebetween. The gate electrodes 111 control carrier transfer between the photoelectric conversion unit 103 a and the corresponding FD region 110 and that between the photoelectric conversion unit 103 b and the corresponding FD region 110, respectively.

An insulator 104 is disposed adjacent to the principal surface 102 of the semiconductor substrate 101. In this embodiment, the insulator 104 is a silicon oxide film. A refractive index of the insulator 104 may be in the range of 1.40 to 1.60. A first interconnect layer 112 a and a second interconnect layer 112 b are arranged adjacent to the principal surface 102 of the semiconductor substrate 101. The first and second interconnect layers 112 a and 112 b are arranged at different levels relative to the principal surface 102 of the semiconductor substrate 101. In this embodiment, the conductive members of the first and second interconnect layers 112 a and 112 b comprise copper. The conductive members may comprise a conductive material other than copper. Part of the conductive member of the first interconnect layer 112 a and part of the conductive member of the second interconnect layer 112 b may be electrically connected to each other through a plug (not illustrated). The conductive members, excluding the parts electrically connected through the plug, of the first and second interconnect layers 112 a and 112 b are isolated from each other by the insulator 104. In other words, the insulator 104 may include an insulating interlayer. The number of interconnect layers is not limited to two. A single interconnect layer or three or more interconnect layers may be arranged.

In this embodiment, the pixel in the light-receiving receiving area and the pixel in the light-shielding area have the same pattern of the conductive member included in the first interconnect layer 112 a or the second interconnect layer 112 b. The pixels in these areas have the same pattern of the conductive member included in at least the first interconnect layer 112 a. As regards a range of the same pattern, the same pattern may be a conductive pattern of at least a portion constituting an electrical node up to the signal output line disposed on the rear of each pixel.

A hole 105 a and a hole 105 b are arranged in the insulator 104. The hole 105 a is associated with the photoelectric conversion unit 103 a. The hole 105 b is associated with the photoelectric conversion unit 103 b. A waveguide member 106 a is disposed in the hole 105 a. A waveguide member 106 b is disposed in the hole 105 b. In this embodiment, each of the waveguide members 106 a and 106 b is a silicon nitride film. Alternatively, each of the waveguide members 106 a and 106 b may be a silicon oxynitride film or comprise an organic material (resin, such as polyimide polymer). In this embodiment, a refractive index of the waveguide members 106 a and 106 b is higher than that of the insulator 104. The refractive index of the waveguide members 106 a and 106 b may be greater than or equal to 1.60. The refractive index thereof may be in the range of 1.80 to 2.40. In this embodiment, the hole 105 a is filled with the waveguide member 106 a. The waveguide member 106 a may, however, be disposed in only part of the hole 105 a. The waveguide member 106 a may comprise a plurality of materials. In this case, the refractive index of any one of the materials may be higher than that of the insulator 104. For example, the waveguide member 106 a may include a silicon nitride film and a silicon oxynitride film. Alternatively, a silicon nitride film may be disposed on the side wall of the hole 105 a and in the vicinity of the bottom thereof and an organic material may be disposed in the other portion of the hole 105 a. The description about the hole 105 a and the waveguide member 106 a can be applied to the hole 105 b and the waveguide member 106 b unless otherwise noted.

An etching stopper 113 is disposed between the semiconductor substrate 101 and each of the waveguide members 106 a and 106 b. The etching stopper 113 is a layer to accurately stop etching in the formation of the holes 105 a and 105 b. Alternatively, the etching stopper 113 may be a layer to delay etching. The etching stoppers 113 are in contact with the waveguide members 106 a and 106 b, respectively. In another aspect, the etching stoppers 113 serve as the bottoms of the holes 105 a and 105 b adjacent to the semiconductor substrate 101. Each etching stopper 113 comprises a material different from that of the insulator 104. In this embodiment, the etching stopper 113 is a silicon nitride film. The etching stopper 113 may be omitted depending on etching conditions. Furthermore, after formation of the etching stoppers 113, the etching stoppers 113 may be removed in etching for forming the holes 105 a and 105 b.

A light-shielding member 108 comprises metal or an organic material that is not transmissive to light. The material of the light-shielding member 108 may exhibit a high reflectivity to light having a wavelength of 400 to 600 nm. In this embodiment, the light-shielding member 108 comprises aluminum. The light-shielding member 108 is disposed over the photoelectric conversion unit 103 b. The light-shielding member 108 may be disposed over the light-shielding area. The light-shielding member 108 does not have to block the whole of light entering the photoelectric conversion unit 103 b. For example, light obliquely traveling from a portion where the light-shielding member 108 is not disposed may enter the photoelectric conversion unit 103 b after multiple reflections.

The light-shielding member 108 may be part of a conductive member included in a third interconnect layer. In other words, the light-shielding member 108 may serve as an interconnect for transmitting a power supply voltage or a signal. Although not illustrated in FIG. 1, the third interconnect layer including the light-shielding member 108 may include a conductive member which serves as pads or interconnects for peripheral circuits. The third interconnect layer where the light-shielding member 108 is disposed may include only the light-shielding member 108.

The positional relationship between the waveguide members 106 a and 106 b, the first and second interconnect layers 112 a and 112 b, and the light-shielding member 108 will now be described. Referring to FIG. 1, d1 denotes the distance (first distance) between the principal surface 102 of the semiconductor substrate 101 and an opposite surface 107 a of the waveguide member 106 a from the semiconductor substrate 101. In FIG. 1, d2 denotes the distance (second distance) between the principal surface 102 of the semiconductor substrate 101 and an opposite surface 107 b of the waveguide member 106 b from the semiconductor substrate 101. In FIG. 1, d3 denotes the distance (third distance) between the principal surface 102 of the semiconductor substrate 101 and the light-shielding member 108. In FIG. 1, d4 denotes the distance (fourth distance) between the principal surface 102 of the semiconductor substrate 101 and an opposite surface of the conductive member, included in the first interconnect layer 112 a, from the semiconductor substrate 101. As illustrated in FIG. 1, the distance 3 between the principal surface 102 and the light-shielding member 108 is greater than the distance d1 between the principal surface 102 and the opposite surface 107 a of the waveguide member 106 a from the semiconductor substrate 101 and the distance d2 between the principal surface 102 and the opposite surface 107 b of the waveguide member 106 b from the semiconductor substrate 101. In other words, the light-shielding member 108 is disposed farther from the semiconductor substrate 101 than the waveguide members 106 a and 106 b. The distance d1 between the principal surface 102 and the opposite surface 107 a of the waveguide member 106 a from the semiconductor substrate 101 and the distance d2 between the principal surface 102 and the opposite surface 107 b of the waveguide member 106 b from the semiconductor substrate 101 are greater than the distance d4. In other words, at least part of each of the waveguide members 106 a and 106 b is disposed farther from the semiconductor substrate 101 than the first interconnect layer 112 a which is the closest to the semiconductor substrate 101.

In this embodiment, the distance d1 between the principal surface 102 and the opposite surface 107 a of the waveguide member 106 a from the semiconductor substrate 101 and the distance d2 between the principal surface 102 and the opposite surface 107 b of the waveguide member 106 b from the semiconductor substrate 101 are greater than the distance between the principal surface 102 and the opposite surface of the conductive member, included in the second interconnect layer 112 b, from the semiconductor substrate 101. The distance d1 and the distance d2 are to be greater than at least the distance d4 between the principal surface 102 and the opposite surface of the conductive member, included in the interconnect layer closest to the semiconductor substrate 101, from the semiconductor substrate 101.

In this embodiment, the distance between the principal surface 102 and the surface of the waveguide member 106 a facing the semiconductor substrate 101 and the distance between the principal surface 102 and the surface of the waveguide member 106 b facing the semiconductor substrate 101 are less than the distance between the principal surface 102 and the surface of the conductive member, included in the first interconnect layer 112 a, facing the semiconductor substrate 101. The arrangement is not limited to the above-described one. For example, the distance between the principal surface 102 and the surface of the waveguide member 106 a facing the semiconductor substrate 101 and the distance between the principal surface 102 and the surface of the waveguide member 106 b facing the semiconductor substrate 101 may be less than the distance between the principal surface 102 and the surface of the conductive member, included in the second interconnect layer 112 b, facing the semiconductor substrate 101 and may be greater than the distance d4 between the principal surface 102 and the opposite surface of the conductive member, included in the first interconnect layer 112 a, from the semiconductor substrate 101.

In this embodiment, the surface of the waveguide member 106 a facing the semiconductor substrate 101 is disposed apart from the principal surface 102 by a predetermined distance. The waveguide members 106 a and 106 b may, however, be in contact with the semiconductor substrate 101.

An intralayer lens 114 converges light traveling toward the semiconductor substrate 101 on the photoelectric conversion unit 103 a or the waveguide member 106 a. The intralayer lens 114 is disposed on an opposite side of the waveguide member 106 a from the semiconductor substrate 101. The intralayer lens 114 is disposed in association with the photoelectric conversion unit 103 a in the light-receiving area. In this embodiment, the intralayer lens 114 comprises a silicon nitride film. The placement of the intralayer lens 114 is not necessarily needed. Although not illustrated in FIG. 1, a color filter and a top lens may be arranged on an opposite side of the intralayer lens 114 from the semiconductor substrate 101.

A method of making the solid-state image pickup device 100 according to this embodiment will now be described with reference to FIGS. 2A to 3C. In FIGS. 2A to 3C, components having the same functions as those in FIG. 1 are designated by the same reference numerals and detailed description thereof is omitted.

FIG. 2A illustrates a step of forming the semiconductor regions in the semiconductor substrate 101 and forming a gate electrode 111, the insulator 104, the etching stoppers 113, and the first and second interconnect layers 112 a and 112 b above the semiconductor layer 101. In this step, the photoelectric conversion units 103 a and 103 b and the FD regions 110 are formed in the semiconductor substrate 101 such that the portions and the regions are arranged in the vicinity of the principal surface 102. At this time, source and drain regions of other transistors in pixel portions may be formed. The gate electrodes 111 are then formed. At this time, gate electrodes of the other transistors in the pixel portions may be formed.

After that, a protective layer 201 is formed on the principal surface 102 adjacent to which the photoelectric conversion units 103 a and 103 b are arranged. For example, the protective layer 201 is a silicon nitride film. The protective layer 201 may be composed of a plurality of layers including a silicon nitride film and a silicon oxide film. The protective layer 201 may have a function of reducing damage to be applied to the photoelectric conversion units in a subsequent step. Moreover, the protective layer 201 may have an antireflection function. The etching stoppers 113 are formed on an opposite surface of the protective layer 201 from the semiconductor substrate 101. The areas of the etching stoppers 113 may be greater than the areas of the respective bottoms of the holes 105 a and 105 b to be formed later. Furthermore, the etching stoppers 113 may be omitted in an area other than the bottoms of the holes 105 a and 105 b. Note that formation of the protective layer 201 and the etching stoppers 113 is not necessarily needed.

The insulator 104, the first interconnect layer 112 a, and the second interconnect layer 112 b are then formed. In this embodiment, the first and second interconnect layers 112 a and 112 b are formed using a damascene process. A case where the insulator 104 is composed of a plurality of insulating interlayers 104 a to 104 e will be described. For the sake of convenience, the insulating interlayers will be called first to fifth insulating interlayers 104 a to 104 e in order from the interlayer closest to the semiconductor substrate 101.

The first insulating interlayer 104 a is formed so as to fully cover the light-receiving area and the light-shielding area. An opposite surface of the first insulating interlayer 104 a from the semiconductor substrate 101 may be planarized as necessary. Through-holes (not illustrated) are formed in the first insulating interlayer 104 a. In the through-holes, plugs electrically connecting the conductive member in the first interconnect layer 112 a to the semiconductor regions in the semiconductor substrate 101 are arranged.

Then, the second insulating interlayer 104 b is formed on an opposite side of the first insulating interlayer 104 a from the semiconductor substrate 101. In the second insulating interlayer 104 b, portions corresponding to regions where the conductive member in the first interconnect layer 112 a is to be disposed are removed by etching. After that, a metal film, serving as the first interconnect layer 112 a, is formed so as to fully cover the light-receiving area and the light-shielding area. Then, the metal film is removed by a method, such as CMP, such that the second insulating interlayer 104 b is exposed. The conductive member which serves as the interconnects in the first interconnect layer 112 a is disposed in a predetermined pattern in the above-described manner.

The third insulating interlayer 104 c and the fourth insulating interlayer 104 d are formed so as to fully cover the light-receiving area and the light-shielding area. In the fourth insulating interlayer 104 d, portions corresponding to regions where the conductive member in the second interconnect layer 112 b is to be disposed are removed by etching. In the third insulating interlayer 104 c, portions corresponding to regions where plugs electrically connecting the conductive member in the first interconnect layer 112 a to the conductive member in the second interconnect layer 112 b are to be arranged are removed by etching. After that, a metal film, serving as the second interconnect layer 112 b and the plugs, is formed so as to fully cover the light-receiving area and the light-shielding area. Then, the metal film is removed by a method, such as CMP, such that the fourth insulating interlayer 104 d is exposed. An interconnect pattern in the second interconnect layer 112 b and a plug pattern are obtained in the above-described manner. After formation of the third and fourth insulating interlayers 104 c and 104 d, the portions corresponding to the regions where the plugs electrically connecting the conductive member in the first interconnect layer 112 a to that in the second interconnect layer 112 b are to be arranged may be removed by etching.

Finally, the fifth insulating interlayer 104 e is formed so as to fully cover the light-receiving area and the light-shielding area. An opposite surface of the fifth insulating interlayer 104 e from the semiconductor substrate 101 may be planarized as necessary.

Furthermore, an etching stopping film, an antireflection metal film, or a film having functions of both of those films may be disposed between the adjacent insulating interlayers. Specifically, in the case where the insulator 104 is a silicon oxide film, a silicon nitride film serves as an antireflection metal film.

The first and second interconnect layers 112 a and 112 b may be formed by a method other than a damascene process. A method other than a damascene process will now be described. After formation of the first insulating interlayer 104 a, the metal film, serving as the first interconnect layer 112 a, is formed so as to fully cover the light-receiving area and the light-shielding area. In the metal film, portions other than the regions where the conductive member in the first interconnect layer 112 a is disposed are removed by etching. Thus, the interconnect pattern of the first interconnect layer 112 a is obtained. After that, the second insulating interlayer 104 b and the third insulating interlayer 104 c are formed and the second interconnect layer 112 b is similarly formed. After the second interconnect layer 112 b is formed, the fourth insulating interlayer 104 d and the fifth insulating interlayer 104 e are formed. Opposite surfaces of the third and fifth insulating interlayers 104 c and 104 e from the semiconductor substrate 101 are planarized as necessary.

As regards the formation of the insulator 104, the insulator 104 may be formed in a region associated with the photoelectric conversion unit 103 a and a region associated with the photoelectric conversion unit 103 b at the same time. The reason is that the insulator 104 serves as the side walls of the holes 105 a and 105 b. The difference in noise between the photoelectric conversion units 103 a and 103 b caused by different steps of forming the insulator 104 is, however, small. Accordingly, the insulator 104 may be formed in the region associated with the photoelectric conversion unit 103 a and the region associated with the photoelectric conversion unit 103 b by different steps.

An interconnect structure of the first and second interconnect layers 112 a and 112 b in the light-receiving area may coincide with that in the light-shielding area. In this arrangement, the parasitic capacitance between the interconnects in the light-receiving area can be substantially equal to that in the light-shielding area.

FIG. 2B illustrates forming the holes 105 a and 105 b in the insulator 104. An etching mask pattern (not illustrated) is disposed on an opposite side of the insulator 104 from the semiconductor substrate 101. The etching mask pattern covers a region other than the regions where the holes 105 a and 105 b are to be arranged. In other words, the etching mask pattern has an opening corresponding to the region where the hole 105 a is to be disposed and another opening corresponding to the region where the hole 105 b is to be disposed. The etching mask pattern is a photoresist patterned by, for example, photolithography and development.

The insulator 104 is then etched using the etching mask pattern as a mask. Thus, the holes 105 a and 105 b are simultaneously formed. After etching of the insulator 104, the etching mask pattern is removed.

In the case where the etching stoppers 113 are arranged, etching can be performed in FIG. 2B such that the etching stoppers 113 are exposed. The etching stoppers 113 may have an etching rate lower than that of the insulator 104 under etching conditions for etching the insulator 104. In the case where the insulator 104 is a silicon oxide film, the etching stoppers 113 may comprise a silicon nitride film or a silicon oxynitride film. The etching stoppers 113 may be exposed by a plurality of etching processes under different conditions.

A feature of one aspect of this embodiment is that the insulator 104 positioned in the region where the hole 105 a is to be formed and the insulator 104 positioned in the region where the hole 105 b is to be formed are simultaneously etched. Accordingly, the etching mask pattern used for etching has an opening corresponding to the region where the hole 105 a is to be disposed and another opening corresponding to the region where the hole 105 b is to be disposed. Etching the insulator 104 using such an etching mask pattern allows the holes 105 a and 105 b to be simultaneously formed. In the above-described step, the holes 105 a and 105 b having substantially the same shape can be formed, except for an influence of, for example, unevenness in the plane of the semiconductor substrate 101. Furthermore, damage caused by etching to the photoelectric conversion unit 103 a may substantially coincide with that to the photoelectric conversion unit 103 b.

FIG. 2C illustrates forming the waveguide members 106 a and 106 b in the holes 105 a and 105 b, respectively. The material of the waveguide members 106 a and 106 b is deposited so as to fully cover the light-receiving area and the light-shielding area. The deposition of the material of the waveguide members 106 a and 106 b can be achieved by film formation by chemical vapor deposition (CVD) or sputtering, or application of an organic material, such as polyimide polymer. After that, the material of the waveguide members 106 a and 106 b protruding from the holes 105 a and 105 b is removed as necessary. The removal of the material of the waveguide members 106 a and 106 b protruding from the holes 105 a and 105 b is not necessarily needed. Each of the waveguide members 106 a and 106 b may be formed such that the opposite end of the waveguide member from the semiconductor substrate 101 is farther from the principal surface 102 of the semiconductor substrate 101 than the second interconnect layer 112 b. In the case where the insulator 104 is etched in the step illustrated in FIG. 2B such that the etching stoppers 113 are exposed, the waveguide members 106 a and 106 b are arranged in contact with the respective etching stoppers 113.

The waveguide members 106 a and 106 b may be formed by multiple depositions of the same material. Furthermore, the waveguide members 106 a and 106 b can be formed by sequential depositions of different materials. For example, a silicon nitride film may be formed and an organic material having high filling ability may then be formed, thus forming the waveguide members 106 a and 106 b.

As regards the material of the waveguide members 106 a and 106 b, any material having a higher refractive index than that of the insulator 104 may be used. In the case where the insulator 104 is a silicon oxide film, examples of the material of the waveguide members 106 a and 106 b include a silicon nitride film and a polyimide organic material. In this embodiment, the refractive index of the silicon nitride film is approximately 2.0. The refractive index of the surrounding silicon oxide film is approximately 1.4. Accordingly, light incident on the interface between the insulator 104 and each of the waveguide members 106 a and 106 b is reflected according to Snell's law. Consequently, the light can be trapped in the waveguide members 106 a and 106 b. The content of hydrogen in the silicon nitride film can be increased, so that dangling bonds from the substrate can be terminated due to the effect of hydrogen supply. Consequently, noise, such as a white defect, can be reduced. The refractive index of the polyimide organic material is approximately 1.7. The filling ability of the polyimide organic material is higher than that of the silicon nitride film. The material of the waveguide members 106 a and 106 b may be appropriately chosen in consideration of the balance between optical characteristics, such as the difference between refractive indices, and benefits of making steps.

In FIG. 2C, a feature of this embodiment is that the waveguide members 106 a and 106 b are simultaneously formed. When the material of the waveguide members 106 a and 106 b is deposited in one of the holes 105 a and 105 b, the material is deposited in the other hole. In the above-described step, the waveguide members 106 a and 106 b having substantially the same shape can be formed, except for an influence of, for example, unevenness in the plane of the semiconductor substrate 101.

FIG. 3A illustrates forming a first planarization film 301 and the light-shielding member 108. The first planarization film 301 is formed on the opposite side of the waveguide members 106 a and 106 b from the semiconductor substrate 101. The first planarization film 301 is, for example, a silicon oxide film. An opposite surface of the first planarization film 301 from the semiconductor substrate 101 is then planarized by CMP. The method of planarization is not limited to CMP. A known method, such as etching or polishing, can be used. In the case where the surface, where the first planarization film 301 is to be formed, is planarized before formation of the film 301, planarization after formation of the film 301 is not necessarily needed. The first planarization film 301 may be omitted.

The light-shielding member 108 is formed on an opposite side of the first planarization film 301 from the semiconductor substrate 101. The light-shielding member 108 is disposed in association with the photoelectric conversion unit 103 b in the light-shielding area. The light-shielding member 108 reflects or absorbs light traveling toward the photoelectric conversion unit 103 b. Accordingly, light-reflective metal or a light-absorbing organic material is suitable for the material of the light-shielding member 108. In this embodiment, the light-shielding member 108 comprises aluminum. As regards a method of forming the light-shielding member 108, the method of making the first interconnect layer 112 a or the second interconnect layer 112 b may be appropriately used. The light-shielding member 108 may be included in the third interconnect layer. Specifically, in the step of forming the light-shielding member 108, the conductive member which serves as pads or interconnects for the peripheral circuits can be simultaneously formed. The light-shielding member 108 may serve as an interconnect.

FIG. 3B illustrates forming the intralayer lens 114. The intralayer lens 114 is formed on the opposite side of the first planarization film 301 from the semiconductor substrate 101. The intralayer lens 114 is disposed in association with the photoelectric conversion unit 103 a in the light-receiving area. The intralayer lens 114 comprises, for example, a silicon nitride film. As regards a method of making the intralayer lens 114, a known method can be used.

In this embodiment, as illustrated in FIG. 3A, the surface of the light-shielding member 108 facing the semiconductor substrate 101 is in contact with the first planarization film 301. As illustrated in FIG. 3B, the surface of the intralayer lens 114 facing the semiconductor substrate 101 is in contact with the first planarization film 301. In other words, the light-shielding member 108 and the intralayer lens 114 are arranged in contact with the same film (e.g., the first planarization film 301), the opposite surface of the film from the semiconductor substrate 101 being planarized. In this arrangement, when a new film is formed so as to cover the light-shielding member 108 and the intralayer lens 114, the difference in level between the light-receiving area and the light-shielding area can be reduced.

A refractive index of the first planarization film 301 may be lower than that of the intralayer lens 114. In this embodiment, the refractive index of the silicon nitride film which serves as the intralayer lens 114 is approximately 2.0 and that of the silicon oxide film which serves as the first planarization film 301 is approximately 1.46. In the above relationship between the refractive indices, sensitivity to oblique incident light can be increased. The reason is as follows. Oblique incident light (indicated at an arrow L1) is not fully converged by the intralayer lens 114, so that the light does not enter the waveguide member 106 a in some cases. In FIG. 3B, a dotted line indicates the optical path of the light in this case. Since the member having a lower refractive index than that of the intralayer lens 114 is disposed between the intralayer lens 114 and the waveguide member 106 a, however, the oblique incident light is converged by the intralayer lens 114 and is then refracted to an optical axis OP. In FIG. 3B, a broken line indicates the optical axis OP. Since the oblique incident light enters the waveguide member 106 a as described above, sensitivity to the oblique incident light can be increased.

FIG. 3C illustrates forming a color filter 303 and a microlens 304. After formation of the light-shielding member 108 and the intralayer lens 114, a second planarization film 302 is formed so as to cover the light-shielding member 108 and the intralayer lens 114. The second planarization film 302 is an insulator. The second planarization film 302 is, for example, a silicon oxide film. An opposite surface of the second planarization film 302 from the semiconductor substrate 101 is planarized as necessary. After that, the color filter 303 and the microlens 304 are formed in a region associated with the photoelectric conversion unit 103 a in the light-receiving area. The color filter 303 and the microlens 304 are arranged as necessary. In this embodiment, in the second planarization film 302, any one of a portion associated with the first photoelectric conversion unit 103 a and another portion associated with the second photoelectric conversion unit 103 b is not removed.

In this embodiment, in the step illustrated in FIG. 2B, the insulator 104 is etched in both the light-receiving area and the light-shielding area simultaneously. As long as etching the insulator 104 is performed in both the light-receiving area and the light-shielding area simultaneously, the holes 105 a and 105 b can be formed at the same time. Specifically, the step of etching the insulator 104 using the etching mask having the opening corresponding to the region where the hole 105 a is to be formed and the other opening corresponding to the region where the hole 105 b is to be formed is a step of simultaneously forming the holes 105 a and 105 b.

If the etching mask has only the opening corresponding to the region where the hole 105 a is to be formed, only the portion of the insulator 104 corresponding to the hole 105 a will be etched in the subsequent etching step. In this step, the holes 105 a and 105 b are not simultaneously formed.

In the step illustrated in FIG. 2C, the material of the waveguide members 106 a and 106 b is deposited in both the holes 105 a and 105 b simultaneously. As long as the material of the waveguide members 106 a and 106 b is deposited both in the holes 105 a and 105 b simultaneously, the waveguide members 106 a and 106 b can be formed at the same time. All of the steps from the step of forming the semiconductor regions in the semiconductor substrate 101 to the step of forming the waveguide members 106 a and 106 b may be simultaneously performed in both the light-receiving area and the light-shielding area.

If a step of forming only one of the waveguide members 106 a and 106 b is included, the waveguide members 106 a and 106 b are not simultaneously formed.

After formation of the light-shielding member 108, the second planarization film 302 is formed. In this embodiment, in the second planarization film 302, only one of a portion associated with the first photoelectric conversion unit 103 a and another portion associated with the second photoelectric conversion unit 103 b is not removed.

Benefits of the arrangement of the etching stoppers 113 in the step illustrated in FIG. 2B will now be described with reference to FIGS. 4A to 4C. In FIGS. 4A to 4C, components having the same functions as those in FIGS. 1 to 3C are designated by the same reference numerals and detailed description thereof is omitted.

FIG. 4A is a plan view of a schematic structure of the solid-state image pickup device 100 according to this embodiment. A light-receiving area 401, a light-shielding area 402, and a peripheral circuit area 403 are illustrated. A plurality of pixels each including the photoelectric conversion unit are arranged in the light-receiving area 401 and the light-shielding area 402. For example, an array of 1920×1080 pixels can be disposed in the light-receiving area 401. The photoelectric conversion units arranged in the light-shielding area 402 are shielded from light. The light-shielding area 402 is positioned between the light-receiving area 401 and the peripheral circuit area 403. In the peripheral circuit area 403, circuits used for operations of the solid-state image pickup device 100 are arranged. In addition, signal processing circuits for processing signals from the photoelectric conversion units are arranged in the peripheral circuit area 403. The circuits arranged in the peripheral circuit area 403 include, for example, a vertical shift register, a horizontal shift register, an amplifier, an analog-to-digital converter (ADC), and a memory. The amplifier, the ADC, and the memory may be arranged for each row of the photoelectric conversion units arranged in the array.

FIGS. 4B and 4C are cross-sectional views of schematic structures of the solid-state image pickup device 100 taken along the lines AB, CD, and EF in FIG. 4A. FIG. 4B illustrates the cross sections, where the etching stoppers 113 are arranged, in the step of FIG. 2B. FIG. 4C illustrates the cross sections, where the etching stoppers 113 are not arranged, in the step of FIG. 2B. The cross section taken along the line AB includes a pixel 401 a disposed in the light-receiving area 401. The cross section taken along the line CD includes a pixel 410 b disposed in the light-receiving area 401 and a pixel disposed in the light-shielding area 402. The pixel 401 b is positioned farther from the center of the light-receiving area 401 than the pixel 401 a. The pixel 401 b is positioned adjacent to the pixel disposed in the light-shielding area 402. The cross section taken along the line EF corresponds to the peripheral circuit area 403.

In this embodiment, the step of forming the first interconnect layer 112 a and the second interconnect layer 112 b includes planarizing. In the planarizing, however, the difference in level between the insulator 104 in the light-receiving area 401 and that in the peripheral circuit area 403 may occur. This is caused by, for example, the difference in a density of arranged plugs between the light-receiving area 401 and the peripheral circuit area 403. The density of plugs means the number of plugs per unit area in plane. For example, the light-receiving area 401 in which the density of plugs is high may be recessed relative to the peripheral circuit area 403 by planarization. The difference in level may be caused due to, for example, the difference in the density of interconnects between these areas. Accordingly, the difference in level between the insulator 104 in the light-receiving area 401 and that in the light-shielding area 402 near the peripheral circuit area 403 may also be caused.

In FIGS. 4B and 4C, h1 denotes the distance between the principal surface 102 of the semiconductor substrate 101 and an opposite surface of the insulator 104 from the semiconductor substrate 101 in the pixel 401 a and h2 denotes the distance between the principal surface 102 of the semiconductor substrate 101 and the opposite surface of the insulator 104 from the semiconductor substrate 101 in the light-shielding area 402. The distance h1 differs from the distance h2 as illustrated in FIGS. 4B and 4C. The difference in level does not tend to occur in a pixel positioned in close proximity to a pixel in the light-shielding area 402. The reason is that the height of the solid-state image pickup device 100 gradually varies from the peripheral circuit area 403 to the center of the light-receiving area 401. Accordingly, the distance, indicated at h3, between the principal surface 102 of the semiconductor substrate 101 and the opposite surface of the insulator 104 from the semiconductor substrate 101 in, for example, the pixel 401 b adjacent to the pixel included in the light-shielding area 402 is approximately equal to the distance h2.

In the case where the etching stoppers 113 are arranged as illustrated in FIG. 4B, the insulator 104 may be etched in the step of FIG. 2B such that the etching stoppers 113 are exposed. Since the etching rate of the etching stoppers 113 is low, etching hardly proceeds after exposure of the etching stoppers 113. Since the etching stoppers 113 serve as the respective bottoms of the holes 105 a and 105 b, the distance between the principal surface 102 of the semiconductor substrate 101 and the bottom of the hole 105 a in the pixel 401 a is substantially equal to the distance between the principal surface 102 of the semiconductor substrate 101 and the bottom of the hole 105 b in the light-shielding area 402. In FIGS. 4B and 4C, z1 denotes the distance between the principal surface 102 of the semiconductor substrate 101 and the bottom of the hole 105 a in the light-receiving area 401 and z2 denotes the distance between the principal surface 102 of the semiconductor substrate 101 and the bottom of the hole 105 b in the light-shielding area 402. In FIG. 4B, the distance z1 is approximately equal to the distance z2.

In the case where the etching stoppers 113 are not arranged, the insulator 104 is etched by an amount depending on etching time. Accordingly, the distance z1 differs from the distance z2 as illustrated in FIG. 4C. The reason is that the above-described difference reflects the original unevenness of the insulator 104.

As described above, the arrangement of the etching stoppers 113 allows the distance z1 (the level of the bottom of the hole 105 a) in the light-receiving area 401 and the distance z2 (the level of the bottom of the hole 105 b) in the light-shielding area 402 to be approximately equal to each other. Consequently, the difference between noise caused in the photoelectric conversion unit in the light-receiving area 401 and that in the light-shielding area 402 can be reduced, so that image quality can be increased.

This embodiment has been described with respect to the case where the refractive index of the waveguide members 106 is higher than that of the insulator 104. It is not always necessary that the refractive index of the waveguide members 106 be higher than that of the insulator 104. For example, a light-reflective member may be attached to the side wall of each hole 105 and the waveguide member 106 may then be disposed in the hole 106.

Second Embodiment

A solid-state image pickup device according to another embodiment of the present invention will now be described with reference to the drawings. FIG. 5A is a cross-sectional view of a schematic structure of a solid-state image pickup device 100 according to a second embodiment. FIG. 5B is a plan view of the schematic structure of the solid-state image pickup device 100 according to the second embodiment. Components having the same functions as those in FIGS. 1 to 4C are designated by the same reference numerals and detailed description is omitted.

A feature of this embodiment is that light-shielding members 501 a to 501 c are arranged such that each member is disposed between the adjacent photoelectric conversion units arranged in the light-receiving area. The second embodiment may provide the same structure as that in the first embodiment, except for this arrangement.

As illustrated in FIG. 5A, a photoelectric conversion unit 103 a and a photoelectric conversion unit 103 c are arranged in the light-receiving area. A waveguide member 106 a is disposed in association with the photoelectric conversion unit 103 a. A waveguide member 106 c is disposed in association with the photoelectric conversion unit 103 c. For the sake of convenience, the photoelectric conversion unit 103 c and the waveguide member 106 c are designated by the reference numerals different from those of the photoelectric conversion unit 103 a and the waveguide member 106 a. The photoelectric conversion units 103 a and 103 c, however, have the same function. Furthermore, the waveguide members 106 a and 106 c have the same function. Accordingly, the description of the photoelectric conversion unit 103 a and that of the waveguide member 106 a in the first embodiment can be appropriately applied to the photoelectric conversion unit 103 c and the waveguide member 106 c.

The light-shielding member 501 b is disposed between the waveguide member 106 a disposed in association with the photoelectric conversion unit 103 a and the waveguide member 106 c disposed in association with the photoelectric conversion unit 103 c. The reason why the light-shielding member 501 b is disposed between the waveguide members 106 a and 106 c is as follows. When the waveguide members 106 a and 106 b and the light-shielding member 501 b are projected on the same plane, the light-shielding member 501 b is projected between a region where the waveguide member 106 a is projected and a region where the waveguide member 106 c is projected. The light-shielding member 501 a is disposed between the waveguide member 106 a and a waveguide member associated with a photoelectric conversion unit of another pixel adjacent to the photoelectric conversion unit 103 a. The light-shielding member 501 c is disposed between the waveguide member 106 c and a waveguide member associated with a photoelectric conversion unit of another pixel adjacent to the photoelectric conversion unit 103 c.

As regards a material of the light-shielding members 501 a to 501 c, the same material as that of the light-shielding member 108 can be appropriately used. The material of the light-shielding members 501 a to 501 c may be the same as that of the light-shielding member 108. In this embodiment, the light-shielding members 501 a to 501 c comprise aluminum. The light-shielding members 501 a to 501 c are arranged farther from the semiconductor substrate 101 than the waveguide members 106 a and 106 c. The light-shielding members 501 a to 501 c may be arranged in the same interconnect layer as that including the light-shielding member 108. Thus, the light-shielding members 501 a to 501 c can be formed without increase of the number of interconnect forming steps. In this embodiment, the light-shielding member 108 and the light-shielding members 501 a to 501 c are arranged in a third interconnect layer.

FIG. 5B is a plan view of the schematic structure of the solid-state image pickup device 100 according to this embodiment. The cross section taken along the line VA-VA in FIG. 5B is illustrated in FIG. 5A. Referring to FIG. 5B, the light-shielding member 501 b is disposed between the waveguide member 106 a associated with the photoelectric conversion unit 103 a and the waveguide member 106 c associated with the photoelectric conversion unit 103 c. The photoelectric conversion unit 103 a may be surrounded by the light-shielding members 501 a and 501 b and light-shielding members 501 d. In other words, the light-shielding members may be arranged in a lattice pattern in the light-receiving area and each photoelectric conversion unit may be disposed in a region surrounded by the light-shielding members. The arrangement is not limited to this one. The light-shielding member 501 b may be disposed in only the region between the photoelectric conversion units 103 a and 103 c. The light-shielding member 108 may be disposed so as to fully cover the light-shielding area. Thus, the quantity of light entering photoelectric conversion units 103 b arranged in the light-shielding area can be reduced.

The solid-state image pickup device 100 according to this embodiment may further include an intralayer lens 114, a color filter 303, and a microlens 304.

A method of forming the above-described light-shielding members 501 a to 501 c will now be described. The method includes the same steps as those illustrated in FIGS. 2A to 2C in the first embodiment. In the step illustrated in FIG. 3A, when the light-shielding member 108 is formed, the light-shielding members 501 a to 501 c included in the same interconnect layer are formed.

In this embodiment, as described above, the light-shielding member 501 b is disposed between the waveguide members 106 a and 106 c in the light-receiving area. Thus, the quantity of light entering a region excluding the waveguide members 106 a and 106 c can be reduced. As regards light entering a region excluding the waveguide members 106 a and 106 c, light is likely to enter a region excluding the photoelectric conversion units in the semiconductor substrate 101. Accordingly, the light entering the region excluding the waveguide members 106 a and 106 c causes noise, such as color mixture. This embodiment, therefore, has a benefit in that noise can be further reduced in addition to the benefits of the first embodiment.

Third Embodiment

A solid-state image pickup device according to a third embodiment of the present invention will now be described with reference to FIG. 6. FIG. 6 is a cross-sectional view of a schematic structure of the solid-state image pickup device, indicated at 100, according to this embodiment. Components having the same functions as those in FIGS. 1 to 5B are designated by the same reference numerals and detailed description thereof is omitted.

A feature of this embodiment is the structure of an intralayer lens 601 disposed on an opposite side of a waveguide member 106 a from a semiconductor substrate 101. The intralayer lens 114 in the first embodiment is a convex lens that protrudes far away from the semiconductor substrate 101. Hereinafter, such a lens will be referred to as an “upwardly protruding lens”. In this embodiment, the intralayer lens 601 is a convex lens that protrudes toward the semiconductor substrate 101. Hereinafter, such a lens will be referred to as a “downwardly protruding lens”.

A method of forming the intralayer lens 601, serving as a downwardly protruding lens, will now be described. The method includes the same steps as those illustrated in FIGS. 2A to 2C in the first embodiment. In the step illustrated in FIG. 3A, when a light-shielding member 108 is formed, light-shielding members 501 a to 501 c included in the same interconnect layer are formed. At this time, the light-shielding members 501 a and 501 c are arranged in a grid pattern. After that, a base member 602 is formed. The base member 602 is disposed so as to cover the light-shielding members 501 a to 501 c. Accordingly, irregularities are caused on the base member 602 by the difference in level between regions where the light-shielding members 501 a to 501 c are arranged and regions where the light-shielding members 501 a to 501 c are not arranged. Since the light-shielding members 501 a to 501 c are arranged in a grid pattern so as to surround each photoelectric conversion unit, a depression is disposed in each region, associated with the photoelectric conversion unit, in the base member 602. A material having a higher refractive index than that of the base member 602 is then deposited on an opposite side of the base member 602 from the semiconductor substrate 101. The intralayer lens 601, serving as a downwardly protruding lens, can be formed by the above-described steps.

After deposition of the material of the intralayer lens 601, an opposite surface of the intralayer lens 601 from the semiconductor substrate 101 may be planarized as necessary. A color filter 303 and microlenses 304 may be further formed.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions. 

What is claimed is:
 1. A method of making a solid-state image pickup device, comprising: preparing a substrate having a first photoelectric conversion unit and a second photoelectric conversion unit; forming a structure on the semiconductor substrate, the structure including a first insulating layer, a second insulating layer arranged between the first insulating layer and the substrate, a first interconnect layer arranged between the second insulating layer and the substrate, and a second interconnect layer arranged between the first insulating layer and the second insulating layer; forming a first hole and a second hole in the structure so that the first hole is arranged on the first photoelectric conversion unit and the second hole is arranged on the second photoelectric conversion unit by etching the first insulating layer and the second insulating layer; forming a first portion in the first hole and a second portion in the second hole in a parallel manner by putting a first material in the first hole and the second hole, after forming the first hole and the second hole in the structure; forming a first film having a first part that covers the first portion and a second part that covers the second portion, the first film comprising a second material different from the first material; forming a light shielding member that covers the second portion so that the second part is arranged between the light shielding member and the second portion; and forming a second film that covers the light shielding member so that the first part is arranged between the second film and the first portion.
 2. The method according to claim 1, wherein the light shielding member is included in a third interconnect layer formed on the first film, and the third interconnect layer includes a conductive member that serves as a pad.
 3. The method according to claim 1, wherein the structure includes: a first member disposed between the second insulating layer and the first photoelectric conversion unit; and a second member disposed between the second insulating layer and the second photoelectric conversion unit, wherein in the forming of the first hole and the second hole, the first member and the second member are used as an etching stopper.
 4. The method according to claim 1, wherein the solid-state image pickup device includes a light-receiving area where the first photoelectric conversion unit is arranged, a light-shielding area where the second photoelectric conversion unit is arranged, and a peripheral circuit area where a signal processing circuit configured to process signals from the first and second photoelectric conversion units is arranged, and wherein the light shielding member is included in a third interconnect layer, and a conductive member included in the third interconnect layer is arranged not in the light-receiving area but in the peripheral circuit area.
 5. The method according to claim 1, wherein the solid-state image pickup device includes a light-receiving area where the first photoelectric conversion unit is arranged, a light-shielding area where the second photoelectric conversion unit is arranged, and a peripheral circuit area where a signal processing circuit configured to process signals from the first and second photoelectric conversion units is arranged, and wherein the structure including a plurality of plugs configured to connect the substrate and the first and second interconnect layers, and a density of the plugs in the light-receiving area is higher than that in the peripheral circuit area.
 6. The method according to claim 1, further comprising forming a lens on the first part before the forming of the second film.
 7. The method according to claim 6, wherein the lens has a refractive index higher than the first film.
 8. The method according to claim 1, wherein further comprising forming at least one of a color filter and a microlens in associated with the first photoelectric conversion unit, in a state where the second film covers the light shielding member.
 9. The method according to claim 1, wherein the first material has a refractive index higher than the first insulating layer and the second insulating layer.
 10. The method according to claim 1, wherein the first material is silicon nitride and the second material is silicon oxide.
 11. The method according to claim 3, wherein the first member is formed over a gate electrode of a transistor with a protective layer interposed therebetween.
 12. The method according to claim 11, wherein a part of the protective layer is between a side surface of the gate electrode and the first member.
 13. The method according to claim 1, wherein the second film is a silicon nitride film.
 14. A method of making a solid-state image pickup device, comprising: preparing a substrate having a first photoelectric conversion unit and a second photoelectric conversion unit; forming a structure on the semiconductor substrate, the structure including a first insulating layer, a second insulating layer arranged between the first insulating layer and the substrate, a first interconnect layer arranged between the second insulating layer and the substrate, and a second interconnect layer arranged between the first insulating layer and the second insulating layer; forming a first hole and a second hole in the structure so that the first hole is arranged on the first photoelectric conversion unit and the second hole is arranged on the second photoelectric conversion unit by etching the first insulating layer and the second insulating layer; forming a first portion in the first hole and a second portion in the second hole in a parallel manner by putting a material in the first hole and the second hole, after forming the first hole and the second hole in the structure; forming a silicon oxide film having a first part that covers the first portion and a second part that covers the second portion; forming a light shielding member that covers the second portion so that the second part is arranged between the light shielding member and the second portion; and forming a silicon nitride film after the forming of the light shielding member so that the first part is arranged between the silicon nitride film and the first portion, wherein the material is different from silicon oxide.
 15. The method according to claim 14, wherein the light shielding member is included in a third interconnect layer formed on the silicon oxide film, and the third interconnect layer includes a conductive member that serves as a pad.
 16. The method according to claim 14, wherein a conductive member included in the first interconnect layer and a conductive member included in the second interconnect layer comprise copper, and the light-shielding member comprises aluminum.
 17. The method according to claim 14, wherein the light shielding member is included in a third interconnect layer formed on the silicon oxide film, and the third interconnect layer includes a conductive member that serves as an interconnect for a circuit.
 18. The method according to claim 14, the solid-state image pickup device includes a light-receiving area where the first photoelectric conversion unit is arranged, a light-shielding area where the second photoelectric conversion unit is arranged, and a peripheral circuit area where a signal processing circuit configured to process signals from the first and second photoelectric conversion units is arranged, the light-shielding area being arranged between the light-receiving area and the peripheral circuit area.
 19. The method according to claim 14, wherein the silicon nitride film is formed to serves as a lens.
 20. The method according to claim 14, wherein after the forming a third interconnect layer and before the forming of the silicon nitride film, forming a member having a refractive index lower than the silicon nitride film on the first part, wherein the third interconnect layer includes the light shielding member.
 21. The method according to claim 14, wherein further comprising forming at least one of a color filter and a microlens in associated with the first photoelectric conversion unit, in a state where the silicon nitride film covers the light shielding member.
 22. The method according to claim 14, wherein the first portion and the second portion comprise silicon nitride containing hydrogen.
 23. The method according to claim 14, wherein the first portion and the second portion is formed by a chemical vapor deposition. 